Proprietary Research and Development of Semiconductor Equipment
Hermes-Epitek Corporation has been extending deep root in the semiconductor process technologies and services. After 45 years of dedication in proprietary research and development of semiconductor equipment, the results have started to show gradually, laying a solid foundation for proprietarily developing semiconductor equipment in Taiwan.
From the technological research and development of electron beam (e-beam), ion beam, to neutron beam; and from fundamental researches in physics and chemistry to equipment development, Hermes-Epitek has integrated international technological teams for years to take deep root in Taiwan. In addition to the industry-leading and successful e-beam equipment for semiconductor process inspection, Advanced Ion Beam Technology, Inc. (AIBT) has manufactured low-energy high-current ion implanter. While cooperating with the largest advanced semiconductor customers in the world to jointly promote the 3 nm process technology, AIBT is also conducting research and development on 2 nm equipment. This puts AIBT on the map as the leading supplier of semiconductor front-end process equipment in Taiwan.
In response to demands in new applications such as new energy and electric vehicles, Hermes-Epitek has also engaged in developing wide bandgap power semiconductor. Via research and development on self-developed equipment (crystal growth furnace) and comprehensive supply chain integration, Hermes-Epitek offers customers diversified and customized solutions. Meanwhile, it also promotes the semiconductor process technology, ranging from the current mainstream silicon wafer to new-generation wide bandgap semiconductor such as silicon carbide (SiC).
Semiconductor is the foundation of all technology industries, and its equipment is an essential sector for Taiwan to keep its leading edge in industry in the future. As the only company with research and development capacity on front-end semiconductor equipment in the country, Hermes-Epitek will continue to develop the local supply chain, deepen the academia-industry cooperation, and enhance local capacities. In addition to keeping up-to-date with developments in the semiconductor sector, Hermes-Epitek will also use these as a basis for precise deployment in the equipment and technology R&D for medical care and other revolutionary technologies.
AIBT High-Current Ion Implanter
The lower-energy high-current ion implanter developed and manufactured by our partner, Advanced Ion Beam Technology, Inc. (AIBT), has been promoting high performance operation of advanced logic and communication chips in the world, and has become one of the key apparatuses in front-end semiconductor production.
Metal Organic Chemical Vapor Deposition (MOCVD) Equipment
The research and development of metal organic chemical vapor deposition (MOCVD) equipment started more than a decade ago. Nowadays, Hermes-Epitek has a comprehensive product line to cater to the demand for compound semiconductor processes, such as GaN, GaN on Si, GaAs, and InP.
ICP Etcher
After years of development, in 2013, Hermes-Epitek introduced an etcher for the optoelectronics industry. In 2021, Hermes-Epitek ventured into the wide bandgap (compound) semiconductor market and launched the four-cavity dry ICP (inductively coupled plasma) etcher to perform etching treatment via the six-inch or eight-inch single wafer transfer mode.
E-beam Evaporator
The E-beam evaporator launched in 2002 has undergone several generations of upgrading, and has been developed into an application model for the lift-off process since 2020.
E-beam Evaporator
Based on the research foundation of advanced process, Hermes-Epitek has also extended the technology layout to the field of precise medication. Hermes-Epitek
