Metal Organic Chemical Vapor Deposition (MOCVD) System

Metal Organic Chemical Vapor Deposition (MOCVD) System

Comprehensive product lines that cover the applications of GaN, GaN-on-Si, GaAs, and InP

Gear-type synchronous rotation mechanism

8''x6, 6"x8, and 4"x18 wafer output, maximizing production capacity

The only manufacturer in Taiwan providing MOCVD equipment

Hermes-Epitek has long been dedicated to innovating and optimizing the MOCVD technology. In addition to models capable of growing materials such as GaN, AIN, GaAs and InP, our MOCVD equipment are suited for a wide range of applications, including high-power electronic components, the LED industry, and the optical communication field. During the development process, and in response to the market’s stringent requirements for high efficiency and high reliability, our MOCVD equipment is designed to meet industry standards and cater to requirements for stable, high-quality processes.

 

Independent Adjustable Heating System

Our MOCVD equipment features a three-zone independently adjustable heating system, combined with precise temperature control and a wafer surface temperature monitoring system. Through a feedback control mechanism, it ensures high precision temperature distribution on wafers.

Planetary Wafer Carrier Motion Design

Furthermore, the system employs a planetary wafer carrier motion design, with adjustable rotation speed for the carrier. It ensures uniform material deposition under various process conditions, meeting the manufacturing requirements for a wide range of precision components.

Inquery Contact

Andrew Kuo

0975-361502