In a high vacuum chamber, the e-beam evaporation equipment heats the material by e-beam irradiation until it is vaporized. The material is then deposited onto the surface of the wafer to form a thin film.
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In a high vacuum chamber, the e-beam evaporation equipment heats the material by e-beam irradiation until it is vaporized. The material is then deposited onto the surface of the wafer to form a thin film.